High definition litho applique and emblems

ABSTRACT

The invention provides high definition litho appliqué and emblems manufactured from appropriate fabric, such as 100% polyester twill or micro fiber material, which has been sublimated with a high definition photograph-quality print. The high definition litho appliqué and emblems are cut into the desired shape and optional affixed to a garment. The invention further provides processes for producing the same.

FIELD OF THE INVENTION

The present invention is generally directed to a process for making highdefinition appliqués and emblems for garments and other material items.More particularly, the present invention is directed to high definitionlitho appliqué and emblems and processes for producing the same.

BACKGROUND OF THE INVENTION

In the textile arts there are many methods and processes for decoratingand/or personalizing fabric including, for example, appliqué,silk-screening, and decorative stitching.

Generally, appliqué involves placing or laminating a first fabric layerover a second fabric layer and securing the first layer in place.Various methods of adhering the first and second fabric layers are knownin the art and include sewing or basting the first layer to the secondlayer, or the use of adhesive material.

Modified appliqués and methods of making the same are known in the artand include methods of making screen printed appliqués as disclosed inU.S. Pat. No. 6,955,124 and methods of making sublimated and screenprinted appliqués as disclosed in U.S. Pat. No. 7,410,932.

This background information is provided for the purpose of making knowninformation believed by the applicant to be of possible relevance to thepresent invention. No admission is necessarily intended, nor should beconstrued, that any of the preceding information constitutes prior artagainst the present invention.

SUMMARY OF THE INVENTION

An object of the present invention is to provide high definition lithoappliqués and emblems and processes for producing the same. Inaccordance with an aspect of the present invention, there is provided amethod for manufacturing high definition litho appliqué comprisingdigitally printing a high resolution image onto transfer paper;transferring the image to an appropriate fabric to obtain an imagedfabric; and cutting out the image from the imaged fabric to obtain ahigh definition litho appliqué. Optionally, the appliqué is a limitededition appliqué. The limited edition appliqué may be either a numberedor open series limited edition. In accordance with one embodiment of theinvention, the method further comprises attaching the high definitionlitho appliqué to a garment.

In accordance with another aspect of the invention, there is provided amethod for manufacturing a garment or hat with high definition lithoemblem comprising digitally printing a high resolution image ontotransfer paper; transferring the image to an appropriate fabric toobtain an imaged fabric; cutting out the image from the imaged fabric toobtain a cut out printed design; cutting out a felt backing for the cutout printed design; and applying the cut out printed design and feltbacking to a garment or hat.

In accordance with another aspect of the invention, there is provided ahigh definition litho appliqué or emblem manufactured from appropriatefabric which has been sublimated with a high definitionphotograph-quality print. In accordance with one embodiment, theappliqué or emblem has the sheen of standard sport twill. Optionally,the appliqué or emblem is a limited edition appliqué or emblem.

In accordance with another aspect of the present invention, there isprovided a method for manufacturing high definition litho appliquécomprising digitally printing a high resolution image onto anappropriate fabric to obtain an imaged fabric; and cutting out the imagefrom the imaged fabric to obtain a high definition litho appliqué. Inaccordance with one embodiment of the invention, the method furthercomprises attaching the high definition litho appliqué to a garment.

BRIEF DESCRIPTION OF THE FIGURES

FIG. 1 is a schematic diagram illustrating the system which makes thehigh definition litho appliqué in accordance with one embodiment of theinvention;

FIG. 2 is a flow chart depicting one embodiment of the method of makinghigh definition litho appliqué;

FIGS. 3A to 3F are photographic representations of the method of makinghigh definition litho appliqué shown in FIG. 2;

FIG. 4 is a flow chart depicting one embodiment of the method of makinghigh definition litho emblems;

FIG. 5 is a schematic diagram illustrating the system which makes thehigh definition litho appliqué in accordance with one embodiment of theinvention;

FIG. 6 is a flow chart depicting one embodiment of the method of makinghigh definition litho appliqué.

DETAILED DESCRIPTION OF THE INVENTION

The present invention provides a method of producing high definitionlitho appliquéand emblems and includes processes for embedding aphotograph or pattern onto a twill or micro fiber appliqué such that thesheen of standard sport twill is maintained. The resulting highdefinition litho appliqué and emblems can optionally be applied togarments or other items.

The present invention further provides high definition litho appliquéand emblems manufactured from appropriate fabric, such as 100% polyestertwill or micro fiber material, which has been sublimated with a highdefinition photograph-quality print. The high definition litho appliquéand emblems are cut into the desired shape and optional affixed to agarment. Optionally, the high definition litho appliqué is in the shapeof standard athletic sport lettering. The design can include any highresolution images including images of people, organizations, companies,teams, animals, landmarks, events including entertainment and/orsporting events, etc. Optionally, the design may incorporate a logoand/or trademark. Alternatively, a logo and/or trademark may be appliedto the garment separately and optionally at a location distinct from thedesign. The logo and/or trademark may be representative of the people,organizations, teams, landmarks and/or events illustrated in thedesign's high resolution image.

In one embodiment, the logo and/or trademark is stitched into the fabricof the garment to which the high definition litho appliqué is affixed.Optionally, the stitching of the logo and/or trademark at least partialaffixes the high definition litho appliqué to the garment.

In one embodiment of the invention, the high definition litho appliquésand/or emblems are produced in a limited edition with each highdefinition litho appliqué and/or emblem in the limited edition seriesassigned a unique number which is printed into the design. Optionally,the numbering is digitally integrated into the design using softwarecapable of a variable data technique. The resulting limited edition highdefinition litho appliqué or emblem is optionally applied to a garmentor other wearable items to form a collectable wearable orcollector-targeted memorabilia article. The limited edition appliqué maybe either a numbered or open series limited edition.

Optionally, the collectable wearable or collector-targeted memorabiliaarticle is package with a authentication statement and/or otherconfirmation of the limited edition status.

In one embodiment, the authentication statement and/or otherconfirmation of limited edition status is affixed to or is integral withthe collectable wearable and is optionally a component of a label.

FIG. 1 schematically illustrates a system (10) for making highdefinition litho appliqué in accordance with one embodiment of theinvention. The system (10) comprises an appropriately programmedcomputer (20) for preparing the design and a plotter (15) such as a wideformat ink jet plotter to digitally print the reverse image usingsublimation inks onto a transfer paper (17), a heat transfer machine(30) to transfer the image to appropriate fabric, scanner (40), flatbedlaser cutter (50) and optionally an embroidery machine (60).

FIGS. 2 and 3A-3F illustrate one method of producing high definitionlitho appliqué using the system shown in FIG. 1. As shown, highresolution images are formed into the Branding or logo design using anappropriately programmed computer. The reverse image of the final designis digitally printed using sublimation inks onto transfer paper.Appropriate printers, inks and transfer papers are known in the art andare available from various suppliers including Sawgrass Technologiesamongst others. Optionally, wide format inkjet plotters can be used.

The printed transfer paper is then imaged onto white 100% polyestertwill or micro fiber fabric at about 400 to about 425 degrees Fahrenheitfor about 25 to about 35 sec. using a heat transfer machine. Optionally,at the same time, a high temperature backing can be applied to the backof the fabric for stability.

The imaged fabric is then scanned into the computer to create two files.The first file is the cut file to be used on a flatbed laser cutter. Thesecond file is the digitized file used on an embroidery machine to sewthe cut design on the garment. The imaged fabric is then accurately cutusing the flatbed laser machine with a camera that will recognize ashape. Alternatively, the image may be cut out using a variety of othermethods known in the art including die cutting, hand cutting andwaterjet cutting. This procedure produces the appliqué which is nowready to be affixed to a garment. The final step is to sew the appliquéon to the garment using a commercial embroidery machine. Alternatively,the appliqué can be affixed to the garment using other means known inthe art.

In one embodiment, in addition to affixing the appliqué to the garment,the stitching forms an integral part of the look and design of the finalproduct. In such embodiments, in addition to being on the perimeter ofthe appliqué, stitching can be used to pick out or highlight detailsfrom the high definition image, add design elements, logos, trademarksand/or lettering. Optionally, the stitching may be in multiple colours,thickness, patterned or textured.

In one embodiment, the appliqué is sewn down strategically using zig zagstitching pattern. To create the rich look of an appliqué, the zig zagpattern is sewn on around each letter or branding to an accuracy ofabout 1 mm.

In one embodiment, the appliqué is sewn down strategically using astitching pattern that is more complicated than standard zig zagstitching achieved by manual means.

FIG. 4 illustrates one method of producing high definition lithoemblems. The desired design is printed using a digital ink jet printerwith dye-sublimation CMYK inks on sublimation paper. The design is thentransferred using a high heat; high-pressure heat press on to a 100%polyester twill or micro fiber substrate. Using a laser cutter equippedwith a magic eye technology or die cut the printed polyester twill ormicro fiber material is precisely cut out. A piece of felt that is 2 mmlarger than the cut out printed design is cut out using a laser cutteror die cutter. The felt with the printed twill or micro fiber materialis applied onto hats or other garments using an embroidery machine.

FIG. 5 schematically illustrates a system (10) for making highdefinition litho appliqué in accordance with one embodiment of theinvention. The system (10) comprises an appropriately programmedcomputer (20) for preparing the design and a plotter (15) such as a wideformat inkjet plotter to digitally print the image on to appropriatefabric, a scanner (40), flatbed laser cutter (50) and optionally anembroidery machine (60).

FIG. 6 illustrates one method of producing high definition lithoappliqué using the system shown in FIG. 5. As shown, high resolutionimages are digitally printed onto white 100% polyester twill or microfiber fabric. The imaged fabric is then scanned and cut out as describedabove to produce the appliqué which is now ready to be affixed to agarment.

Although the invention has been described with reference to certainspecific embodiments, various modifications thereof will be apparent tothose skilled in the art without departing from the spirit and scope ofthe invention. All such modifications as would be apparent to oneskilled in the art are intended to be included within the scope of thefollowing claims.

1. A method for manufacturing high definition litho appliqué comprising(a) digitally printing a high resolution image onto transfer paper; (b)transferring the image to an appropriate fabric to obtain an imagedfabric; and (c) cutting out the image from the imaged fabric to obtain ahigh definition litho appliqué.
 2. The method of claim 1, wherein step(a) further comprises printing a unique number into each appliquéapplied of a specific design.
 3. A high definition litho appliquéproduced by the method of claim
 1. 4. A high definition litho appliquéproduced by the method of claim 2, wherein the high definition lithoappliqué is a limited edition high definition litho appliqué.
 5. Themethod of claim 1 further comprising (d) attaching the high definitionlitho appliqué to a garment.
 6. The method of claim 5, wherein step (d)comprises affixing the high definition litho appliqué with a complexstitching pattern.
 7. A garment produced by the method of claim
 5. 8.The garment of claim 7, further comprising a separate trademark or logo.9. A method for manufacturing a garment or hat with high definitionlitho emblem comprising (a) digitally printing a high resolution imageonto transfer paper; (b) transferring the image to an appropriate fabricto obtain an imaged fabric; (c) cutting out the image from the imagedfabric to obtain a cut out printed design; (d) cutting out a feltbacking for the cut out printed design; and (e) applying the cut outprinted design and felt backing to a garment or hat.
 10. The method ofclaim 9, wherein step (e) comprises affixing the printed design and feltbacking with a complex stitching pattern.
 11. A garment or hat producedby the method of claim
 9. 12. A high definition litho appliqué or emblemmanufactured from appropriate fabric which has been sublimated with ahigh definition photograph-quality print.
 13. A method for manufacturinghigh definition litho appliqué comprising (a) digitally printing a highresolution image onto an appropriate fabric to obtain an imaged fabric;and (b) cutting out the image from the imaged fabric to obtain a highdefinition litho appliqué.
 14. The method of claim 13 further comprising(c) attaching the high definition litho appliqué to a garment.
 15. Themethod of claim 14, wherein step (c) comprises affixing the highdefinition litho appliqué with a complex stitching pattern.